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Popular pages
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New Photoresists or AZ Resists, MicroChemicals GmbH
The manufacturer Merck informed us that the protective coating AZ 520 D will be phased out no later than end of 2021 ( Basically, the AZ 520 D is a photoresist without photoactive compound, which sh...
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Solvents, Solvent, Acetone, Butyl Acetate, Ethanol, Ethyl Lactate, Isopropyl Alcohol, MEK, Methanol
Our Solvents for Semiconductor Processing and Microelectronics It's our goal to supply you with all chemicals required in the field of micro-structuring, in the purity grade demanded for research and ...
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Photoresist Thick Positive AZ 40XT Photoresists MicroChemicals GmbH
AZ ® 40 XT requires only short softbake times, no delay for rehydration, very small exposure doses due to its chemical amplification, and shows a high development rate. Therefore, processing of the A...
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Downloads Photoresists Brochures Productdatasheets, Saftydatascheets MicroChemicals GmbH
Here you can find data sheets about our products, material safety, or our brochures and application notes. Please be advised that product data sheets and material safety data sheets are password prot...
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Deep-UV Photoresist AZ TX 1311 Photoresists MicroChemicals GmbH
UV-sensitivity: 248 nm General Information AZ ® TX 1311 is a chemically amplified positive deep-UV (DUV) resist for very highaspect ratios at resist film thicknesses of several µm. AZ ® TX 1311 is op...
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Photoresist AZ nLof 2035 Photoresists MicroChemicals GmbH
AZ AZ UV-sensitivity: i-line (365 nm), NOT g- or h-line sensitive Sales volumes: 100 ml, 250 ml, 500 ml, 1000 ml, 2,5 L and 3,78 L bottles Beside the resist types above, MicroChemicals dilutes the A...